| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reacting furnace cleaning unit capable of easily and surely removing attachment on the inner wall surface of a multicrystalline silicon reacting furnace. <P>SOLUTION: In the reacting furnace cleaning unit 1 for cleaning the inner wall surface 72 of a two-tier furnace wall of a reacting furnace 70 for forming a multicrystalline silicon, a drain outlet 12 is formed in a quasi-disk-shaped tray 10 arranged horizontally, a flange part 13 is formed in a place where the opening rim part of the reacting furnace 70 is arranged at the peripheral part of the tray 10, a shaft 20 which is rotatable and movable in a vertical direction is arranged in a through-hole 11 formed in the central part of the tray 10, a nozzle unit 50 which atomizes cleaning water at a high pressure to three-dimensional directions is arranged at the top of the shaft 20, a driving mechanism 30 which rotates the shaft 20 and moves it in the vertical direction is arranged below the tray 10 of the shaft 20, and steam piping 62 is arranged on the furnace wall 70 of the reacting furnace 70 to supply steam between the outer wall 70A and the inner wall 70B. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
