发明名称 METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To form an organic semiconductor thin film of high orientation by preventing crystal growth from a place other than a painting start place. <P>SOLUTION: Ink 11 is dried from a paint start place of the ink 11 that contains organic semiconductor material, and the organic semiconductor material in the ink 11 is crystallized to form an organic semiconductor thin film 15. At that time, what including a nozzle body part 2a containing an overhang part constituting a tip face 2f that faces the surface of a substrate 12 and a solution discharge part 2c containing a discharge opening 2g that protrudes to the substrate 12 side from the tip face 2f of the nozzle body part 2a while extended with one direction as a length direction is used as a nozzle part 2. The ink 11 is discharged under such condition as a lower end of the solution discharge part 2c is separated from the substrate 12. While a liquid reservoir is formed between the solution discharge part 2c and the substrate 12 using the discharged ink 11, and the nozzle part 2 is shifted in the direction vertical to the length direction of the discharge opening 2g so that the ink 11 is applied in a line. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013077799(A) 申请公布日期 2013.04.25
申请号 JP20120124954 申请日期 2012.05.31
申请人 DENSO CORP 发明人
分类号 H01L21/368;H01L21/336;H01L29/786;H01L51/05;H01L51/40 主分类号 H01L21/368
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