SILICON-CONTAINING SURFACE MODIFIER, COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION CONTAINING THE SAME, AND METHOD FOR PATTERN FORMATION

摘要

PROBLEM TO BE SOLVED: To provide a resist underlayer film applicable to a resist pattern, obtained in negative development, formed with a hydrophilic organic compound.SOLUTION: There is provided a silicon-containing surface modifier containing one or both of a repeating unit represented by general formula (A) and a partial structure represented by general formula (C).