| 摘要 |
PROBLEM TO BE SOLVED: To provide a drift correction method capable of enhancing the correction accuracy by detecting drift, which has been difficult to detect conventionally, and to provide a drawing data creation method suitable for such a drift correction method.SOLUTION: The drawing area of a mask M is divided into a plurality of stripes, with a width corresponding to the area density of a graphic pattern drawn on the mask M by means of an electron beam B. The amount of drift is measured when drawing is ended for at least one stripe, and the irradiation position of the electron beam B is corrected using this amount of drift. The width of the stripe is narrowed at a part where the area density of a graphic pattern is large, and widened at a part where the area density of a graphic pattern is small. Preferably, the drawing area is divided with a width corresponding to the variation of drift from the start of irradiation of an electron beam B. |
