| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a technique advantageous for reflecting the corresponding offset correction information on a processed substrate out of a plurality of substrates in a lot.SOLUTION: A lithography device for patterning on a substrate transported from a coating device for coating the substrate with resist includes an acquisition unit for acquiring first specific information, for specifying a processed substrate transported from the coating device to the lithography device, out of a plurality of substrates coated with resist by the coating device and processed, from the coating device, and a processing unit for selecting the offset correction information corresponding to the processed substrate from a plurality of types of offset correction information corresponding to the plurality of substrates, respectively, based on the first specific information, and processing the processed substrate by using the offset correction information thus selected.</p> |
