| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming method which has suitability even for the substrate thermally deformable of plastics or the like, is convenient and excellent in productivity, reforms the surface of the substrate excellent in persistence of functionality and imparts functionality.SOLUTION: A film forming method of a substrate is configured so as to successively perform the following processes (1) to (3) on the substrate: the process (1) of forming an under-coat film layer by using a composition (1) which contains a resin A having an isocyanate reactive group and an isocyanate group-containing polymerizable unsaturated compound (B); the process (2) of forming a functionality-imparting layer on the undercoat film layer formed on the process (1) by using a composition (2) which contains a functionality imparting group-containing polymerizable unsaturated compound and photopolymerization initiator; and a process (3) of applying an active energy ray onto the functionality imparting layer formed by (2). |
