发明名称 Sn ALLOY ELECTROLYSIS PLATING METHOD AND PLATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To plate while supplying both metal ions of additional component for Sn and an alloy and to avoid replacing precipitation of the additional component at no electric conduction when Sn alloy such as Sn-Ag based alloy or Sn-Cu based alloy is electrolytic plated.SOLUTION: In a plating tank 1 pooling plating solution, a first anode 11 consisting of Sn and a second anode 12 consisting of an additional component of a Sn alloy are provided. A plated matter is electrolytic plated while the anode 11 and 12 are applied an electric current, and a surface of the first anode 11 is shielded from metal ions of the additional component in the plating solution at no electric conduction to the anode 11 and 12.
申请公布号 JP2015214736(A) 申请公布日期 2015.12.03
申请号 JP20140099519 申请日期 2014.05.13
申请人 MITSUBISHI MATERIALS CORP 发明人 HATTA KENJI
分类号 C25D21/00;C25D3/60;C25D17/00;C25D17/10 主分类号 C25D21/00
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