发明名称 |
RESOLUTION ENHANCEMENT TECHNIQUES BASED ON HOLOGRAPHIC IMAGING TECHNOLOGY |
摘要 |
Systems and techniques for performing resolution enhancement on target patterns based on holographic imaging technique (HIT) are described. During operation, an electronic design automation (EDA) tool can compute an in-line hologram of the target patterns based on parameters associated with a photolithography process that is used in a semiconductor manufacturing process, wherein the semiconductor manufacturing process is to be used for printing the target patterns on a semiconductor wafer. Next, the EDA tool can determine the mask patterns based on the in-line hologram. |
申请公布号 |
US2015339802(A1) |
申请公布日期 |
2015.11.26 |
申请号 |
US201514720646 |
申请日期 |
2015.05.22 |
申请人 |
Synopsys, Inc. |
发明人 |
Isoyan Artak;Melvin, III Lawrence S. |
分类号 |
G06T3/40;G06K9/62;G06K9/46;G06T7/00 |
主分类号 |
G06T3/40 |
代理机构 |
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代理人 |
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主权项 |
1. A non-transitory computer-readable storage medium storing instructions for an electronic design automation (EDA) tool that, when executed by a computer, cause the computer to perform a method to determine mask patterns so that patterns printed on a semiconductor wafer by using a semiconductor manufacturing process are substantially similar to target patterns, the method comprising:
computing an in-line hologram of the target patterns based on parameters associated with a photolithography process that is used in the semiconductor manufacturing process; and determining the mask patterns based on the in-line hologram. |
地址 |
Mountain View CA US |