PLASMA SPRAY COATING DESIGN USING PHASE AND STRESS CONTROL

摘要

To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC is provided and a ceramic coating is coated on the body, wherein the ceramic coating includes a compound of Y2O3, Al2O3, and ZrO2. The ceramic coating is applied to the body by a method including providing a plasma spraying system having a plasma current in the range of between about 100 A to about 1000 A, positioning a torch standoff of the plasma spraying system a distance from the body between about 60 mm and about 250 mm, flowing a first gas through the plasma spraying system at a rate of between about 30 L/min and about 400 L/min, and plasma spray coating the body to form a ceramic coating, wherein splats of the coating are amorphous and have a pancake shape.

主权项

1. An article comprising:
a body comprising at least one of Al, Al2O3, MN, Y2O3, YSZ, or SiC; and a plasma-sprayed ceramic coating on at least one surface of the body, the ceramic coating comprising a compound comprising Y2O3, Al2O3, and ZrO2, the ceramic coating further comprising a plurality of overlapping pancake-shaped splats, wherein the ceramic coating has an amorphous phase.