发明名称 Dual arm vacuum robot
摘要 A dual arm robot for a substrate processing system includes a base and a first arm having extended and retracted positions. Each of the first and second arms includes a first arm portion having one end rotatably connected to the base, a second arm portion having one end rotatably connected to another end of the first arm portion, and an end effector having one end rotatably connected to another end of the second arm portion and another end configured to support first and second substrates, respectively. When the first and second arms are arranged in the retracted position, connections between the second arm portions and the end effectors are located over or under the second and first substrates, respectively, and the first substrate is not located over or under the second substrate.
申请公布号 US9190306(B2) 申请公布日期 2015.11.17
申请号 US201314092240 申请日期 2013.11.27
申请人 LAM RESEARCH CORPORATION 发明人 Blank Richard;McLellan Matt
分类号 H01L21/67;H01L21/677;B25J11/00;B25J9/04 主分类号 H01L21/67
代理机构 代理人
主权项 1. A dual arm robot for a substrate processing system, comprising: a base; a first arm having extended and retracted positions and including: a first arm portion having one end rotatably connected to the base;a second arm portion having one end rotatably connected to another end of the first arm portion; andan end effector having one end rotatably connected to another end of the second arm portion and another end configured to support a first substrate; and a second arm having extended and retracted positions including: a first arm portion having one end rotatably connected to the base;a second arm portion having one end rotatably connected to another end of the first arm portion; andan end effector having one end rotatably connected to another end of the second arm portion and another end configured to support a second substrate,wherein when the first and second arms are arranged in the retracted position:a connection between the second arm portion of the first arm and the end effector of the first arm is located directly above the second substrate;a connection between the second arm portion of the second arm and the end effector of the second arm is located directly under the first substrate; andthe first substrate is not located over the second substrate.
地址 Fremont CA US