PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND MANUFACTURING METHOD OF ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a configuration in which a tilting mechanism of an optical element is made compact compatibly with independently correcting eccentric three aberrations.SOLUTION: A projection optical system packaged in an exposure device includes first and second optical elements and first and second drive mechanisms for driving the first and second optical elements, respectively. The first drive mechanism drives the first optical element in such a manner that the first optical element is tilted around a first point on an optical axis of the projection optical system relatively to a surface perpendicular to the optical axis. The second drive mechanism drives the second optical element in such a manner that the second optical element is tilted around a second point on the optical axis relatively to the surface perpendicular to the optical axis. The second point is movable in a direction of the optical axis of the projection optical system by the second drive mechanism. A control section controls the first and second drive mechanisms so as to correct eccentric three aberrations of the projection optical system.