发明名称 SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor substrate which can achieve high resistance in a region of a high-resistance layer on a channel layer side while decreasing a carbon concentration and a transition metal concentration in the channel layer; and provide a semiconductor element manufactured by using the semiconductor substrate.SOLUTION: A semiconductor substrate comprises: a substrate; a buffer layer on the substrate; a high-resistance layer on the buffer layer, which is composed of a nitride semiconductor and contains transition metal and carbon; and a channel layer on the high-resistance layer, which is composed of a nitride semiconductor. The high-resistance layer has a decrease layer which contacts the channel layer and has a concentration of the transition metal, which decreases from the buffer layer side toward the channel layer side. A decrease rate of a carbon concentration decreasing toward the channel layer is larger than a decrease rate of the transition metal concentration decreasing toward the channel layer.
申请公布号 JP2015201574(A) 申请公布日期 2015.11.12
申请号 JP20140080323 申请日期 2014.04.09
申请人 SANKEN ELECTRIC CO LTD;SHIN ETSU HANDOTAI CO LTD 发明人 SATO KEN;SHIKAUCHI HIROSHI;GOTO HIROICHI;SHINOMIYA MASARU;TSUCHIYA KEITARO;HAGIMOTO KAZUNORI
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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