发明名称 |
SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor substrate which can achieve high resistance in a region of a high-resistance layer on a channel layer side while decreasing a carbon concentration and a transition metal concentration in the channel layer; and provide a semiconductor element manufactured by using the semiconductor substrate.SOLUTION: A semiconductor substrate comprises: a substrate; a buffer layer on the substrate; a high-resistance layer on the buffer layer, which is composed of a nitride semiconductor and contains transition metal and carbon; and a channel layer on the high-resistance layer, which is composed of a nitride semiconductor. The high-resistance layer has a decrease layer which contacts the channel layer and has a concentration of the transition metal, which decreases from the buffer layer side toward the channel layer side. A decrease rate of a carbon concentration decreasing toward the channel layer is larger than a decrease rate of the transition metal concentration decreasing toward the channel layer. |
申请公布号 |
JP2015201574(A) |
申请公布日期 |
2015.11.12 |
申请号 |
JP20140080323 |
申请日期 |
2014.04.09 |
申请人 |
SANKEN ELECTRIC CO LTD;SHIN ETSU HANDOTAI CO LTD |
发明人 |
SATO KEN;SHIKAUCHI HIROSHI;GOTO HIROICHI;SHINOMIYA MASARU;TSUCHIYA KEITARO;HAGIMOTO KAZUNORI |
分类号 |
H01L21/338;H01L29/778;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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