System and method for production of nanostructures over large areas

摘要

A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

主权项

1. A method for printing a desired pattern of periodic features into a photosensitive layer, which comprises the steps of:
providing a substrate bearing the photosensitive layer; providing a mask bearing a mask pattern of periodic features; disposing the substrate in proximity to the mask so that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto; providing substantially collimated light for illuminating the mask pattern to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance, and so that the transmitted light-field has an intensity envelope in the first plane; illuminating the mask with the substantially collimated light while displacing the substrate relative to the mask in a direction that is substantially parallel to both the first plane and the substrate, whereby the desired pattern is printed into the photosensitive layer; and forming the tilt angle and the intensity envelope in relation to the Talbot distance so that the photosensitive layer is substantially exposed to an average of the range of transversal intensity distributions.