| 发明名称 |
ELECTRONIC DEVICE AND MANUFACTURING METHOD OF THE SAME |
| 摘要 |
According to one embodiment, an electronic device includes a MEMS element formed on an underlying region, and a stack film covering the MEMS element and forming a cavity part inside, wherein the stack film includes a first layer having a hole, a second layer provided on the first layer and covering the hole, a third layer provided on the second layer and formed of an oxide, and a fourth layer provided on the third layer and formed of a nitride. |
| 申请公布号 |
US2015307345(A1) |
申请公布日期 |
2015.10.29 |
| 申请号 |
US201514642474 |
申请日期 |
2015.03.09 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
OBARA Kei;HIRAYU Tsuyoshi;IGARASHI Kiyonori |
| 分类号 |
B81B7/00;B81C1/00 |
主分类号 |
B81B7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An electronic device comprising:
a MEMS element formed on an underlying region; and a stack film covering the MEMS element and forming a cavity part inside, wherein the stack film includes a first layer having a hole, a second layer provided on the first layer and covering the hole, a third layer provided on the second layer and formed of an oxide, and a fourth layer provided on the third layer and formed of a nitride. |
| 地址 |
Tokyo JP |
