发明名称 |
HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYING METHOD |
摘要 |
A high frequency power supply device and power supplying method are disclosed, which can rapidly and accurately control power used for generation of plasmas. The device includes a first high frequency power supply, providing power at frequency f1, and a second high frequency power supply providing power at frequency f2 (f1>f2). The first power supply includes: a first high frequency oscillator, which excites the high frequency power at the first frequency and has a variable frequency; a first power amplification block, which amplifies the power of the high frequency oscillator; a heterodyne detection block, which performs heterodyne detection of a reflected wave; and a first control block, which receives a signal after detection of the heterodyne detection block and a traveling wave signal, and controls an oscillating frequency of the first high frequency oscillating block and an output of the first power amplification block. |
申请公布号 |
US2015289355(A1) |
申请公布日期 |
2015.10.08 |
申请号 |
US201514745273 |
申请日期 |
2015.06.19 |
申请人 |
PEARL KOGYO CO., LTD. ;ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI |
发明人 |
Hayano Eiich;Nakamura Takeshi;Maekawa Yasunori;Iizuka Hiroshi;Chen Jinyuan |
分类号 |
H05H1/46 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
1. A high frequency power supply device, at least comprising a first high frequency power supply block, which supplies a plasma processing chamber with a high frequency power at a first frequency, and a second high frequency power supply block, which supplies the plasma processing chamber with a high frequency power at a second frequency below the first frequency, wherein:
the first high frequency power supply block comprises: a first high frequency oscillating block, which excites the high frequency power at the first frequency and has a variable frequency; a first power amplification block, which receives an output of the first high frequency oscillating block and amplifies the power thereof; a first directivity coupler, which receives a reflected wave from the plasma processing chamber and a traveling wave from the first power amplification block; a first reflected wave heterodyne detection block, which performs heterodyne detection of a reflected wave signal from the first directivity coupler; and a first control block, which receives a signal after detection of the first reflected wave heterodyne detection block and a traveling wave signal from the first directivity coupler, and controls an oscillating frequency of the first high frequency oscillating block and an output level of the first power amplification block. |
地址 |
Osaka JP |