发明名称 Acrylic ester derivative, high-molecular compound and photoresist composition
摘要 The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1):;wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each of R2, R3, R5, R7, R8, and R10 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group; each of R4 and R6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group, or R4 and R6 are linked together to form an alkylene group, —O—, or —S—; R9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or —COOR11; R11 represents an alkyl group; X represents —O— or >N—R12; R12 represents a hydrogen atom or an alkyl group; Y represents >C═O or >S(═O)n; n is an integer of 0 to 2; and the wavy lines represent that either R8 or R9 may be in an endo or exo position.
申请公布号 US9152042(B2) 申请公布日期 2015.10.06
申请号 US201113820855 申请日期 2011.09.02
申请人 KURARAY CO., LTD. 发明人 Nakayama Osamu;Yada Manabu
分类号 G03F7/004;C07D209/56;C07D327/04;C07D307/00;C07D493/08;C07D497/18;G03F7/039;C08F220/36;C08F220/28;C08F220/18 主分类号 G03F7/004
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. An acrylic ester derivative of formula (1): wherein R1 is a hydrogen atom, a methyl group, or a trifluoromethyl group; R2, R3, R5, R7, R8, and R10 are each independently a hydrogen atom, a C1 to C6 alkyl group, a C3 to C6 cycloalkyl group, or a C1 to C6 alkoxy group; R4 and R6 are each independently a hydrogen atom, a C1 to C6 alkyl group, a C3 to C6 cycloalkyl group, or a C1 to C6 alkoxy group, or R4 and R6 are linked together to form a C1 to C3 alkylene group, —O—, or —S—; R9 is a hydrogen atom, a C1 to C6 alkyl group, a C3 to C6 cycloalkyl group, a C1 to C6 alkoxy group, or —COOR11, wherein R11 is a C1 to C3 alkyl group; X is —O—; Y is —S(═O)n—, n is an integer of from 0 to 2; and R8 and R9 are each independently in an endo or exo position.
地址 Kurashiki-shi JP
您可能感兴趣的专利