发明名称 |
Acrylic ester derivative, high-molecular compound and photoresist composition |
摘要 |
The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1):;wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each of R2, R3, R5, R7, R8, and R10 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group; each of R4 and R6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group, or R4 and R6 are linked together to form an alkylene group, —O—, or —S—; R9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or —COOR11; R11 represents an alkyl group; X represents —O— or >N—R12; R12 represents a hydrogen atom or an alkyl group; Y represents >C═O or >S(═O)n; n is an integer of 0 to 2; and the wavy lines represent that either R8 or R9 may be in an endo or exo position. |
申请公布号 |
US9152042(B2) |
申请公布日期 |
2015.10.06 |
申请号 |
US201113820855 |
申请日期 |
2011.09.02 |
申请人 |
KURARAY CO., LTD. |
发明人 |
Nakayama Osamu;Yada Manabu |
分类号 |
G03F7/004;C07D209/56;C07D327/04;C07D307/00;C07D493/08;C07D497/18;G03F7/039;C08F220/36;C08F220/28;C08F220/18 |
主分类号 |
G03F7/004 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. An acrylic ester derivative of formula (1): wherein R1 is a hydrogen atom, a methyl group, or a trifluoromethyl group; R2, R3, R5, R7, R8, and R10 are each independently a hydrogen atom, a C1 to C6 alkyl group, a C3 to C6 cycloalkyl group, or a C1 to C6 alkoxy group; R4 and R6 are each independently a hydrogen atom, a C1 to C6 alkyl group, a C3 to C6 cycloalkyl group, or a C1 to C6 alkoxy group, or R4 and R6 are linked together to form a C1 to C3 alkylene group, —O—, or —S—; R9 is a hydrogen atom, a C1 to C6 alkyl group, a C3 to C6 cycloalkyl group, a C1 to C6 alkoxy group, or —COOR11, wherein R11 is a C1 to C3 alkyl group; X is —O—; Y is —S(═O)n—, n is an integer of from 0 to 2; and R8 and R9 are each independently in an endo or exo position. |
地址 |
Kurashiki-shi JP |