MAGNETIC MATERIAL-MADE SPUTTERING TARGET, AND MANUFACTURING METHOD OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a magnetic material-made sputtering target, in particular a non-magnetic material particle dispersion type ferromagnetic material-made sputtering target, which suppresses an abnormal discharge of an oxide, which is a cause of generating particles in sputtering, and to provide a manufacturing method of the target.SOLUTION: A magnetic material-made sputtering target, which includes an oxide having an average particle diameter of 400 nm or less. A manufacturing method of the magnetic material-made sputtering target including the oxide includes steps of: depositing the magnetic material on a substrate by a PVD or CVD method; removing the substrate from the magnetic material deposited; pulverizing this magnetic material to produce a target raw material; and sintering the raw material.