发明名称 METHOD OF MANUFACTURING GRAVURE PLATES FOR OFFSET PRINTING
摘要 <p>There is provided a method of manufacturing a gravure plate for offset printing. The method includes: coating a glass substrate with a copper metal; forming a photoresist film on the coated copper metal; forming a desired photoresist pattern by exposing the photoresist film to light and then developing the photoresist film to remove photoresist from some of the photoresist film; plating the photoresist-removed region with nickel; and removing the remaining photoresist and grinding a nickel-plated surface. The method for manufacturing a gravure plate for offset printing may be useful to provide a gravure plate that has high pattern precision since the photoresist pattern is formed by the photolithography process, excellent thickness uniformity due to the use of the glass substrate, and excellent durability since the outermost surface of the gravure plate is made of nickel.</p>
申请公布号 WO2009091229(A2) 申请公布日期 2009.07.23
申请号 WO2009KR00278 申请日期 2009.01.19
申请人 LG CHEM, LTD.;LEE, DONG-WOOK;HWANG, IN-SEOK;CHUN, SANG-KI;KIM, SEUNG-WOOK 发明人 LEE, DONG-WOOK;HWANG, IN-SEOK;CHUN, SANG-KI;KIM, SEUNG-WOOK
分类号 B41N1/00 主分类号 B41N1/00
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