发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of preferably carrying out a series of processes on substrates even in an abnormal state where a process unit is incapable of transporting likewise a normal state. SOLUTION: The substrate treating apparatus comprises a plurality of kind-classified process sections (31, 45, 46, 47), a main transporting mechanism transporting substrates in predetermined order to the kind-classified process sections, and a control section controlling the main transporting mechanism. The kind-classified process sections each have an arbitrary number of process units (HP<SB>1</SB>, CPa<SB>1</SB>, SC<SB>1</SB>, CPb<SB>1</SB>). The control section allows the substrates to be transported one by one between respective kind-classified process sections which are successive in order at predetermined transporting cycle time intervals in the normal state. If at least one process unit is in an abnormal state of disabled transporting, scheduled serial transporting of predetermined substrates which are transported through the abnormal process unit in the normal state is interrupted and scheduled transporting of substrates which are transported not via the abnormal process unit in the normal state is carried as scheduled. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009164256(A) 申请公布日期 2009.07.23
申请号 JP20070340430 申请日期 2007.12.28
申请人 SOKUDO CO LTD 发明人 OGURA HIROYUKI;MIHASHI TAKESHI;FUKUTOMI YOSHIMITSU;MORINISHI TAKEYA;KAWAMATSU YASUO;NAGASHIMA HIROJI
分类号 H01L21/027;H01L21/677 主分类号 H01L21/027
代理机构 代理人
主权项
地址