发明名称 PHOTOCURABLE COATING COMPOSITION, OVERPRINT, AND MANUFACTURING METHOD FOR IT
摘要 PROBLEM TO BE SOLVED: To provide a photocurable coating composition excellent in surface smoothness and to provide an overprint and a manufacturing method for it excellent in surface smoothness and non-tacking properties by using the photocurable coating composition. SOLUTION: The photocurable coating composition comprises (A) a silicon-containing polymer having ethylenic unsaturated bonds, (B) a photopolymerization initiator, and (C) a compound having ethylenic unsaturated bonds. The overprint and the manufacturing method of it produced by using the photocurable coating composition are provided. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009079126(A) 申请公布日期 2009.04.16
申请号 JP20070249437 申请日期 2007.09.26
申请人 FUJIFILM CORP 发明人 KAKINO TATSUTERU
分类号 C09D143/04;C08F290/12;C09D4/02;C09D5/00;C09D7/12;C09D133/04;C09D183/07;G03G13/20 主分类号 C09D143/04
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