发明名称 GERMANIDE THIN FILM, METHOD OF FORMING THE SAME, AND GERMANIUM STRUCTURAL BODY PROVIDED WITH THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a germanide thin film which is low in resistance and superior in thermal stability. SOLUTION: A Pt thin film 12 is formed on a germanium (Ge) substrate 11, and an Ni thin film 13 is formed above the Pt thin film 12. Then, the substrate is heated to form an (Ni<SB>1-x</SB>Pt<SB>x</SB>)Ge thin film made of three elements, e.g. Ni, Pt and Ge on the Ge substrate. The crystal orientation of crystal grains forming the germanide thin film has such an orientation that a [102] plane or a [001] plane is parallel to the [110] crystal plane of the germanium substrate. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009081159(A) 申请公布日期 2009.04.16
申请号 JP20070247138 申请日期 2007.09.25
申请人 UNIV NAGOYA 发明人 NAKATSUKA OSAMU;SAKAI AKIRA;SUZUKI ATSUSHI;OGAWA MASAKI;ZAIMA SHIZUAKI
分类号 H01L21/28;H01L29/78 主分类号 H01L21/28
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