发明名称 |
RESIN BLACK MATRIX, LIGHT SHIELDING PHOTOSENSITIVE RESIN COMPOSITION AND LIQUID CRYSTAL DISPLAY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin black matrix excellent in light blocking effect and having such a sufficiently high volume resistivity and a sufficiently low relative dielectric constant as not to cause problems such as a short circuit and malfunction even when formed on a TFT element substrate. <P>SOLUTION: The resin black matrix has an optical density of ≥3, a volume resistivity of ≥1×10<SP>13</SP>Ω cm and a relative dielectric constant at 1 kHz of ≤6. The resin black matrix preferably has a crossing angle θ to a substrate of 40-90°. A light shielding photosensitive resin composition for forming the resin black matrix is also provided which contains an alkali-soluble resin, a photopolymerization initiator, an ethylenically unsaturated compound and a light shielding pigment, wherein a content of the light shielding pigment is 30-50 wt.% based on a total solid content and a carbon black is contained as the light shielding pigment in an amount of 2-20 wt.% based on the total solid content. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009075446(A) |
申请公布日期 |
2009.04.09 |
申请号 |
JP20070245666 |
申请日期 |
2007.09.21 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
TAKADA YOSHIHIRO;TOSHIMITSU ERIKO;KADOWAKI MASAMI;HIROTA TAKAO |
分类号 |
G02B5/20;G02B5/00;G02F1/1335;G02F1/1368;G03F7/004;G03F7/027 |
主分类号 |
G02B5/20 |
代理机构 |
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