发明名称 RESIN BLACK MATRIX, LIGHT SHIELDING PHOTOSENSITIVE RESIN COMPOSITION AND LIQUID CRYSTAL DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To provide a resin black matrix excellent in light blocking effect and having such a sufficiently high volume resistivity and a sufficiently low relative dielectric constant as not to cause problems such as a short circuit and malfunction even when formed on a TFT element substrate. <P>SOLUTION: The resin black matrix has an optical density of &ge;3, a volume resistivity of &ge;1&times;10<SP>13</SP>&Omega; cm and a relative dielectric constant at 1 kHz of &le;6. The resin black matrix preferably has a crossing angle &theta; to a substrate of 40-90&deg;. A light shielding photosensitive resin composition for forming the resin black matrix is also provided which contains an alkali-soluble resin, a photopolymerization initiator, an ethylenically unsaturated compound and a light shielding pigment, wherein a content of the light shielding pigment is 30-50 wt.% based on a total solid content and a carbon black is contained as the light shielding pigment in an amount of 2-20 wt.% based on the total solid content. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009075446(A) 申请公布日期 2009.04.09
申请号 JP20070245666 申请日期 2007.09.21
申请人 MITSUBISHI CHEMICALS CORP 发明人 TAKADA YOSHIHIRO;TOSHIMITSU ERIKO;KADOWAKI MASAMI;HIROTA TAKAO
分类号 G02B5/20;G02B5/00;G02F1/1335;G02F1/1368;G03F7/004;G03F7/027 主分类号 G02B5/20
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