发明名称 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMATION OF CURED FILM USING THE SAME
摘要 PURPOSE: A positive photosensitive resin composition is provided to ensure excellent sensitivity, remaining film rate and preservation stability. CONSTITUTION: A positive photosensitive resin composition contains: a resin which is insoluble in alkali; a polymer or copolymer having a constitutive unit induced from radically polymerizable monomers having functional group; and a compound generating acid by irradiation of actinic ray.
申请公布号 KR20100119723(A) 申请公布日期 2010.11.10
申请号 KR20100039999 申请日期 2010.04.29
申请人 FUJIFILM CORPORATION 发明人 TAKITA SATOSHI;ANDO TAKESHI
分类号 G03F7/039 主分类号 G03F7/039
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