发明名称 |
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMATION OF CURED FILM USING THE SAME |
摘要 |
PURPOSE: A positive photosensitive resin composition is provided to ensure excellent sensitivity, remaining film rate and preservation stability. CONSTITUTION: A positive photosensitive resin composition contains: a resin which is insoluble in alkali; a polymer or copolymer having a constitutive unit induced from radically polymerizable monomers having functional group; and a compound generating acid by irradiation of actinic ray. |
申请公布号 |
KR20100119723(A) |
申请公布日期 |
2010.11.10 |
申请号 |
KR20100039999 |
申请日期 |
2010.04.29 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TAKITA SATOSHI;ANDO TAKESHI |
分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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