发明名称 |
Method and apparatus for cleaning spin coater |
摘要 |
A method of cleaning a spin coater apparatus is provided. In one embodiment, the method comprises providing a spin coater apparatus having a coater cup comprising a basin with sidewalls, a rotatable platform situated inside the cup adapted for holding and rotating a wafer to be coated, and a solvent dispensing means mounted under the rotatable platform; placing the substrate on the rotatable platform; rotating the rotatable platform; continuously dispensing a cleaning solvent from the solvent dispensing means to rinse the backside of the wafer with the cleaning solvent and to pre-wet an interior surface of the sidewalls; and dispensing a coating material upon the wafer, the substrate mounted on the rotatable platform. |
申请公布号 |
US8091504(B2) |
申请公布日期 |
2012.01.10 |
申请号 |
US20060522990 |
申请日期 |
2006.09.19 |
申请人 |
HSIEH CHUN-JEN;PENG CHI-KANG;YANG WEN-HAO;TSAO HUNG-TAI;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
HSIEH CHUN-JEN;PENG CHI-KANG;YANG WEN-HAO;TSAO HUNG-TAI |
分类号 |
B05C11/02;B05B15/04 |
主分类号 |
B05C11/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|