Formation of dopant profile on semiconductor component in manufacture of solar cell, involves applying phosphorus dopant source on semiconductor component, forming dopant profile, removing source and forming other dopant profile

摘要

Formation of dopant profile on wafer-like semiconductor component involves applying phosphorus dopant source on surface of wafer-like semiconductor component, forming dopant profile (a) with dopant source, removing dopant source, and forming dopant profile (b) having depth more than dopant profile (a).