SUBSTRATE HAVING MULTILAYER REFLECTION FILM, REFLECTIVE MASK BLANK AND REFLECTIVE MASK, MASK BLANK AND MASK, METHOD OF MANUFACTURING SUBSTRATE HAVING MULTILAYER REFLECTION FILM, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING MASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide a substrate having a multilayer reflection film having formed thereon a reference mark for managing coordinates of defects in a highly accurate manner.SOLUTION: A reference mark representing a reference for a defect position in defect information is formed on an EUV light-reflecting multilayer reflection film in a multilayer reflection film-attached substrate on which this multilayer reflection film is formed. The reference mark comprises a main mark for determining a reference point of the defect position, and an auxiliary mark arranged around the main mark. The main mark has a point-symmetrical shape and has a portion having a width from 200 nm to 10 μm inclusive in the scan direction of defect inspection light or an electron beam lithography machine.