发明名称 透明導電積層体付基板及びその製造方法
摘要 <p>Disclosed is a substrate which has a transparent conductive multilayer structure formed on a surface of the substrate and containing indium oxide, characterized in that the transparent conductive multilayer structure comprises a first transparent conductive film having an indium oxide content of 80-98 mass% and, formed on the surface of the first transparent conductive film, a second transparent conductive film having an indium oxide content of 45-75 mass%, and that the first transparent conductive film and the second transparent conductive film have crystals which are equal in crystal structure to the indium oxide crystals.</p>
申请公布号 JP5780550(B2) 申请公布日期 2015.09.16
申请号 JP20110551850 申请日期 2011.01.25
申请人 发明人
分类号 H01B5/14;B32B7/02;B32B9/00;C01G19/00;C01G23/04;C01G30/00;C01G49/00;H01B13/00 主分类号 H01B5/14
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