发明名称 SUBSTRATE LOADING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
摘要 <p>A thin and large substrate can be loaded on a substrate loading device while suppressing an increase in the number of support pins. A loading table(3) is prepared in the substrate loading device. The loading table comprises a loading surface(30) on which a substrate(F) of 0.5 mm or shorter is loaded. A plurality of support pins(4) supporting the substrate(F) from a lower side vertically penetrate the loading table(3). Elevation devices(45-47) are elevated between a support location and a retreat location of a lower side wherein the support pins(4) and the substrate(F) are supported on the support location. A leading end of at least one of the support pins(4) includes an elastic member(42) wherein the size of the surface of an elastic member in contact with the substrate(F) gets larger by elastic deformation when the substrate(F) is supported from a lower side.</p>
申请公布号 KR20150103632(A) 申请公布日期 2015.09.11
申请号 KR20150028208 申请日期 2015.02.27
申请人 TOKYO ELECTRON LIMITED 发明人 ITO TAKESHI
分类号 H01L21/683;H01L21/677 主分类号 H01L21/683
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