Polylactide/silicon-containing block copolymers for nanolithography

摘要

A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block copolymer may be synthesized by a combination of anionic and ring opening polymerization reactions. This block copolymer may form nanoporous materials that can be used as etch masks in lithographic patterning.

主权项

1. A method of forming nanostructures on a surface, comprising a) providing a silicon and lactide-containing block copolymer and a surface, wherein said surface is coated with a surface energy neutralizing layer comprising parylene; b) spin coating said block copolymer on said surface to create a coated surface; and c) annealing said coated surface to create nanostructures on said surface.