树脂组成物、使用该组成物的抗蚀膜、抗蚀剂涂布空白罩幕、抗蚀图案形成方法以及光罩;RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST COATED BLANK MASK, RESIST PATTERN FORMING METHOD, AND PHOTOMASK

摘要

一种感光化射线性或感放射线性树脂组成物，其包括：高分子化合物(A)，具有酚性羟基、且满足下述(a)及下述(b)；化合物(B)，藉由光化射线或放射线的照射而产生酸；以及交联剂(C)，藉由酸的作用而使高分子化合物(A)进行交联、且玻璃转移温度(Tg)为200℃以上；(a)重量平均分子量为3000以上、6500以下，(b)玻璃转移温度(Tg)为140℃以上。; a compound (B) which produces an acid by irradiation of actinic rays or radiation rays; and (C) a crosslinking agent which crosslinks the polymer compound (A) by an action of acid, and a glass transition temperature (Tg) is 200 ℃; (a) a weight average molecular weight is 3000 or more and 6500 or less, (b) a glass transition temperature (Tg) is 140 ℃