Illumination optical system for projection lithography

摘要

An illumination optical system for projection lithography has an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optical system divides a bundle of the illumination light into a plurality of part bundles, which are allocated to various illumination directions of the object field illumination. The illumination optical system is configured in such a way that at least some of the part bundles are superimposed on one another in a first superimposition plane according to a first superimposition specification and in a second superimposition plane, which is spaced apart from the first superimposition plane, according to a second superimposition specification. The result is an illumination optical system, in which an influencing and/or a monitoring of an illumination intensity distribution over the object field is made possible, as far as possible without influencing an illumination angle distribution.

主权项

1. An illumination optical system, comprising:
an optical assembly configured so that, during use of the illumination optical system, the optical assembly guides illumination light to an object field in an object plane; and an energy sensor comprising a sensor region, wherein the illumination optical system is configured so that, during use of the illumination optical system:
the illumination optical system divides a bundle of the illumination light into a plurality of part bundles which are allocated to various illumination directions of the object field illumination; andat least some of the part bundles are superimposed on one another:
in a first superimposition plane according to a first superimposition;in a second superimposition plane according to a second superimposition, the second superimposition plane being spaced apart from the first superimposition plane;neither the first superimposition plane nor the second superimposition plane coincides with the object plane, and wherein the sensor region is in the first superimposition plane, and the illumination system is a projection lithography illumination system.