发明名称 Reconfigurable lithographic structures
摘要 A lithographically structured device has an actuation layer and a control layer operatively connected to the actuation layer. The actuation layer includes a stress layer and a neutral layer that is constructed of materials and with a structure such that it stores torsional energy upon being constructed. The control layer is constructed to maintain the actuation layer substantially in a first configuration in a local environmental condition and is responsive to a change in the local environmental condition such that it permits a release of stored torsional energy to cause a change in a structural configuration of the lithographically structured device to a second configuration, the control layer thereby providing a trigger mechanism. The lithographically structured device has a maximum dimension that is less than about 10 mm when it is in the second configuration.
申请公布号 US9108314(B2) 申请公布日期 2015.08.18
申请号 US201414206585 申请日期 2014.03.12
申请人 The Johns Hopkins University 发明人 Gracias David H.;Leong Timothy G.
分类号 G01N15/06;G01N33/00;G01N33/48;B25J7/00;B81B3/00;B81C99/00 主分类号 G01N15/06
代理机构 Venable LLP 代理人 Venable LLP ;Daley Henry J.;Riggs F. Brock
主权项 1. A method of encapsulating or gripping a sub-millimeter size object, comprising: disposing a lithographically structured device proximate said sub-millimeter size object, said lithographically structured device having a first structural configuration; storing torsional energy in said lithographically structured device in said first structural configuration; and changing an environmental condition proximate said lithographically structured device to release said torsional energy to cause said lithographically structured device to change to a second structural configuration to thereby encapsulate or grip said object, wherein said lithographically structured device has a maximum dimension in said second structural configuration that is less than about 1 mm.
地址 Baltimore MD US