Precursors and methods for the selective deposition of cobalt and manganese on metal surfaces

摘要

Provided are metal coordination complexes comprising a pyrrole or imidazole-based ligands and cobalt or manganese. Also provided are methods for the selective deposition of cobalt and/or manganese films on metal surfaces using these metal coordination complexes comprising a pyrrole or imidazole-based ligand.

主权项

1. A metal coordination complex comprising a structure represented by one of: wherein R is hydrogen or any C1-C6 alkyl group and M is selected from cobalt and manganese.