发明名称 CHEMICAL PROCESSING APPARATUS AND CHEMICAL PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To calculate the processing time of a workpiece accurately using the integration time of chemical processing time, in a chemical processing system where the change in the effect of a chemical is represented by a function of the chemical processing time.SOLUTION: A chemical processing apparatus includes a plurality of processing chambers, and a chemical supply device for circulation supplying the chemical to the plurality of processing chambers. Furthermore, a correction device for calculating a change in the effect of the chemical based on the chemical discharge time, when using a chemical the effect of which changes by the chemical discharge time, and correcting the discharge time of chemical for each of the plurality of processing chambers, based on the change in the effect of the chemical thus calculated and the integration time of chemical discharge time, is provided.
申请公布号 JP2015135861(A) 申请公布日期 2015.07.27
申请号 JP20140005859 申请日期 2014.01.16
申请人 TOSHIBA CORP 发明人 TOBISAWA TAKESHI;YAMADA KOREI;OGAWA YOSHIHIRO
分类号 H01L21/306;H01L21/304 主分类号 H01L21/306
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