APPARATUS FOR CLEANING A WAFER BLOCK

摘要

According to an embodiment, an apparatus for cleaning a wafer block includes: a block loading chuck for installing a fixing block which is a cleaning object; a chuck support part which is installed to the lower side of the block loading chuck to be rotated; and a block cleaning part which is located on the upper side of the fixing block and can selectively touch the surface of the fixing block. The block cleaning part includes: a cylinder connection load which can be moved in a first direction and a second direction vertical to the first direction; brushes which are prepared at the end of a side of the cylinder connection load; and a blade which is prepared at the end of a side of the cylinder connection load.