| 摘要 |
<p>Provided are an apparatus and a method for heating a substrate. The apparatus for treating a substrate comprises: a temperature measurement member measuring the temperature of each heating zone; a controller receiving measurement data measured from the temperature measurement member and correcting the temperature of the heating unit; a measurement plate in which sensors measuring each temperature of the heating zones are installed; and a transmitter installed on the measurement plate and transmitting the measurement data based on the temperature measured from the sensors wirelessly. The controller comprises: a receiver receiving the measurement data from the transmitter; and a data processing unit analyzing the measurement data provided to the receiver, and calculating a set value so that a heater can heat the heating zones to the set temperature. As the data measured by the measurement plate are transmitted wirelessly, a process for repeatedly carrying in and taking the measurement plate out of facilities for treating the substrate.</p> |
