发明名称 METHOD FOR PRODUCING SILICA ABRASIVE GRAIN AND METHOD FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for producing silica abrasive grains free from the risk of damaging the object to be polished and also free from deterioration in a polishing speed.SOLUTION: Provided is a method for producing silica abrasive grains including: a treatment of subjecting silicic acid to polycondensation to produce the primary grains of silica; and a treatment of passing a solution including the primary grains through a capillary tube and fusion-growing the primary grains each other in the capillary tube while retaining the temperature of the capillary tube to the fixed one to produce the fused grains of silica.</p>
申请公布号 JP2015124120(A) 申请公布日期 2015.07.06
申请号 JP20130270018 申请日期 2013.12.26
申请人 HOYA CORP 发明人 TOKUMITSU HIDEZO
分类号 C01B33/141;B24B37/00;C09G1/02;C09K3/14;G11B5/84 主分类号 C01B33/141
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