发明名称 |
METHOD FOR PRODUCING SILICA ABRASIVE GRAIN AND METHOD FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for producing silica abrasive grains free from the risk of damaging the object to be polished and also free from deterioration in a polishing speed.SOLUTION: Provided is a method for producing silica abrasive grains including: a treatment of subjecting silicic acid to polycondensation to produce the primary grains of silica; and a treatment of passing a solution including the primary grains through a capillary tube and fusion-growing the primary grains each other in the capillary tube while retaining the temperature of the capillary tube to the fixed one to produce the fused grains of silica.</p> |
申请公布号 |
JP2015124120(A) |
申请公布日期 |
2015.07.06 |
申请号 |
JP20130270018 |
申请日期 |
2013.12.26 |
申请人 |
HOYA CORP |
发明人 |
TOKUMITSU HIDEZO |
分类号 |
C01B33/141;B24B37/00;C09G1/02;C09K3/14;G11B5/84 |
主分类号 |
C01B33/141 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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