| 主权项 |
1. A wafer processing method for dividing a wafer into a plurality of individual devices along a plurality of crossing division lines, said wafer being composed of a substrate and a functional layer formed on a front side of said substrate, said division lines being formed on a front side of said functional layer to thereby define a plurality of separate regions where said devices are respectively formed, said wafer processing method comprising:
a functional layer cutting step of applying a laser beam along each division line formed on said functional layer of said wafer to thereby ablate said functional layer and form a laser processed groove cutting said functional layer along each division line; a protective member attaching step of attaching a protective member to the front side of said functional layer of said wafer after performing said functional layer cutting step; a cut groove forming step of holding said wafer on a chuck table in the condition where said protective member is in contact with said chuck table after performing said protective member attaching step, and next positioning a cutting blade on a back side of said substrate of said wafer in the area corresponding to each division line to form a cut groove having a depth not reaching said functional layer; a wafer supporting step of attaching a dicing tape to the back side of said substrate of said wafer after performing said cut groove forming step, supporting an outer circumferential portion of said dicing tape to an annular frame, and next peeling off said protective member; and a tape expanding step of expanding said dicing tape attached to the back side of said substrate of said wafer to increase the spacing between said devices after performing said wafer supporting step. |
