发明名称 Plasma generation apparatus
摘要 A plasma generation apparatus includes a vacuum container, dielectrics connected to through-holes formed in the vacuum container, RF coils of the same structure disposed in the vicinity of the respective dielectrics and electrically connected in parallel, an RF power source to supply power to the RF coils, an impedance matching circuit disposed between the RF power source and the RF coils, and a power distribution unit disposed between the impedance matching circuit and one ends of the RF coils to distribute the power of the RF power source to the RF coils. The power distribution unit includes a power distribution line and a conductive outer cover enclosing the power distribution line. Distance between an input end of the power distribution unit and the RF coils are equal to each other, and the other ends of the RF coils are connected to the conductive outer cover to be grounded.
申请公布号 US9066413(B2) 申请公布日期 2015.06.23
申请号 US201314082795 申请日期 2013.11.18
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 Chang Hong-Young;An Sanghyuk;Lee Jinwon
分类号 H01J7/24;H05B41/36;H05H1/24;H05H1/46;H01J37/32 主分类号 H01J7/24
代理机构 Jenkins, Wilson, Taylor & Hunt, P.A. 代理人 Jenkins, Wilson, Taylor & Hunt, P.A.
主权项 1. A plasma generation apparatus comprising: a vacuum container; a plurality of dielectrics connected to through-holes formed in the vacuum container; a plurality of RF coils of the same structure, which are disposed in the vicinity of the respective dielectrics and are electrically connected in parallel; an RF power source to supply power to the RF coils; an impedance matching circuit disposed between the RF power source and the RF coils; and a power distribution unit disposed between the impedance matching circuit and one ends of the RF coils to distribute the power of the RF power source to the RF coils, wherein the power distribution unit comprises: a power distribution line; anda conductive outer cover enclosing the power distribution line, andwherein distances between an input end of the power distribution unit and the RF coils are distances between node points including an input node (N1) of the power distribution unit and RF coil nodes,further comprising:permanent magnets spaced apart from the RF coils, respectively, anda magnet fixing plate to fix the permanent magnets and adjust a vertical distance between the permanent magnets and the RF coils.
地址 Daejeon KR