发明名称 |
APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION |
摘要 |
Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed. A support part arranged opposite the injector head, the support part constructed to provide a gas bearing pressure arrangement that balances the injector head gas-bearing in the conveying plane, so that the substrate is held supportless by said gas bearing pressure arrangement in between the injector head and the support part. |
申请公布号 |
US2015167167(A1) |
申请公布日期 |
2015.06.18 |
申请号 |
US201514599517 |
申请日期 |
2015.01.18 |
申请人 |
Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO |
发明人 |
VERMEER Adrianus Johannes Petrus Maria;JANSSEN Gabi P. |
分类号 |
C23C16/455;C23C16/56;C23C16/50 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
|
主权项 |
1. An apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising:
an injector head comprising
a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface;a bearing gas injector arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming an injector head gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed; and a support part arranged opposite the injector head, the support part constructed to provide a gas bearing pressure arrangement from an opposite side of the substrate with respect to the injector head gas-bearing, the gas bearing pressure arrangement providing a gas bearing pressure that balances the injector head gas-bearing in the conveying plane, so that the substrate is held supportless by said gas bearing pressure arrangement, between the injector head and the support part;wherein the bearing gas injector defines, relative to the substrate, a gap distance which in combination with the gas bearing pressure provides a gas bearing stiffness between 103 and 1010 N/m3. |
地址 |
Delft NL |