SUBSTRATE HEATING UNIT

摘要

A substrate heating unit is disclosed. The substrate heating unit comprises: a rotatable chuck stage on the top of which a substrate is laid; a hollow rotation part joined to the chuck stage to rotate the chuck stage; a back nozzle which passes through the inside of the rotation part and is arranged at the upper top of the chuck stage to inject a treatment liquid to the rear side of the substrate; a heating part which is separated from the top of the chuck stage and has ring-shaped lamps concentrically arranged around the center of the chuck stage at different radial distances; and a reflective plate provided between the heating part and the chuck stage to reflect thermal energy emitted from the heating part to the substrate; and temperature sensor assemblies installed on the reflective plate to measure the temperature of each lamp.