PHASE SHIFT MASK BLANK FOR MANUFACTURING DISPLAY DEVICE, PHASE SHIFT MASK FOR MANUFACTURING DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a phase shift mask blank for manufacturing a display device, which includes a phase shift film showing optical characteristics having suppressed wavelength dependency with respect to exposure light.SOLUTION: A phase shift mask blank 1 includes a transparent substrate 2 and a phase shift film 3 formed on the transparent substrate 2. The phase shift film 3 comprises a monolayer film or a multilayer film having at least one layer of a metal silicide material layer containing a metal, silicon, and at least one element of nitrogen and/or oxygen. The phase shift film 3 shows a transmittance of 3.5% or more and 8% or less at a wavelength of 365 nm, a phase difference of 160 degrees or more and 200 degrees or less at a wavelength of 365 nm, and within 5.5% of a variation of the transmittance depending on wavelength in a wavelength range from 365 nm to 436 nm.