| 发明名称 |
METHOD FOR THE METALLIZATION OF A POROUS MATERIAL |
| 摘要 |
Metallization method for a porous material including deposition of a metallic material in the liquid phase using a solution containing metal ions, the conditions consisting of the solution temperature, the pH of the solution, and the concentration of metal ions in solution being chosen to result in a deposition rate of the metallic material less than or equal to 0.1 nm/min. |
| 申请公布号 |
US2015155175(A1) |
申请公布日期 |
2015.06.04 |
| 申请号 |
US201414555926 |
申请日期 |
2014.11.28 |
| 申请人 |
Commissariat A L'energie Atomique Et Aux Ene Alt ;STMicroelectronics SA |
发明人 |
HALIMAOUI Aomar;VANDROUX Laurent |
| 分类号 |
H01L21/288;H01L21/768 |
主分类号 |
H01L21/288 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. Metallization method for a porous material including deposition of a metallic material in the liquid phase on the porous material, using a solution containing metal ions, the conditions consisting of the solution temperature, the pH of the solution, and the concentration of metal ions in solution being chosen to result in a non-zero deposition rate of the metallic material equal to less than or equal to the order of 0.1 nm/min. |
| 地址 |
Paris FR |
