APPARATUS FOR PROCESSING SUBSTRATE

摘要

Provided is a substrate processing apparatus. The substrate processing apparatus in which a process with respect to a substrate is performed includes a main chamber having a passage that is defined in one sidewall thereof to load or unload the substrate and upper and lower openings that are respectively defined in upper and lower portions thereof, a chamber cover closing the upper opening of the main chamber to provide a process space that is blocked from the outside to perform the process, a showerhead disposed in the process space, the showerhead having a plurality of spray holes that spray a process gas, a lower heating block on which the substrate is placed on an upper portion thereof, the lower heating block being fixed to the lower opening and having a lower installation space separated from the process space, and a plurality of lower heaters disposed in the lower installation space in a direction parallel to the substrate to heat the lower heating block.

主权项

1. A substrate processing apparatus in which a process with respect to a substrate is performed, the substrate processing apparatus comprising:
a main chamber having a passage that is defined in one sidewall thereof to load or unload the substrate and upper and lower openings that are respectively defined in upper and lower portions thereof; a chamber cover closing the upper opening of the main chamber to provide a process space that is blocked from the outside to perform the process; a showerhead disposed in the process space, the showerhead having a plurality of spray holes that spray a process gas; a lower heating block on which the substrate is placed on an upper portion thereof, the lower heating block being fixed to the lower opening and having a lower installation space separated from the process space; and a plurality of lower heaters disposed in the lower installation space in a direction parallel to the substrate to heat the lower heating block.