发明名称 Stress-inducing Structures, Methods, and Materials
摘要 Stress-inducing structures, methods, and materials are disclosed. In one embodiment, an isolation region includes an insulating material in a lower portion of a trench formed in a workpiece and a stress-inducing material disposed in a top portion of the trench over the insulating material.
申请公布号 US2015137253(A1) 申请公布日期 2015.05.21
申请号 US201414565243 申请日期 2014.12.09
申请人 Infineon Technologies AG 发明人 Gutmann Alois;Hampp Roland;Jansen Scott
分类号 H01L29/78;H01L29/06 主分类号 H01L29/78
代理机构 代理人
主权项 1. An isolation structure comprising: a trench disposed in a workpiece; a first insulating material disposed in a lower portion of the trench; a stress-inducing material disposed over the first insulating material; and a divot comprising a gutter-shaped depression disposed in the stress-inducing material.
地址 Neubiberg DE