发明名称 |
Stress-inducing Structures, Methods, and Materials |
摘要 |
Stress-inducing structures, methods, and materials are disclosed. In one embodiment, an isolation region includes an insulating material in a lower portion of a trench formed in a workpiece and a stress-inducing material disposed in a top portion of the trench over the insulating material. |
申请公布号 |
US2015137253(A1) |
申请公布日期 |
2015.05.21 |
申请号 |
US201414565243 |
申请日期 |
2014.12.09 |
申请人 |
Infineon Technologies AG |
发明人 |
Gutmann Alois;Hampp Roland;Jansen Scott |
分类号 |
H01L29/78;H01L29/06 |
主分类号 |
H01L29/78 |
代理机构 |
|
代理人 |
|
主权项 |
1. An isolation structure comprising:
a trench disposed in a workpiece; a first insulating material disposed in a lower portion of the trench; a stress-inducing material disposed over the first insulating material; and a divot comprising a gutter-shaped depression disposed in the stress-inducing material. |
地址 |
Neubiberg DE |