| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a polyene-polythiol-based resin composition excellent in heat resistance.SOLUTION: There is provided a resin composition containing (A) a silsesquioxane derivative represented by the general formula [1] having two or more carbon-carbon unsaturated bonds per a molecule and a random type structure, (B) polythiol and (C) photo-radical polymerization initiator. The general formula [1], where Rhas one or more kind of functional group selected from a (meth)acryloyl group, a vinyl group, a vinyl ether group, an allyl group and an allyl ether group and Rmay be same or different, a part of the (meth)acryloyl group, the vinyl group, the vinyl ether group, the allyl group and the ally ether group may be substituted by an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a halogen and m represents a polymerization degree.</p> |
