| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To avoid reduction in an acceptable range for position on drawing surface in an optic axis orientation for drawing a pattern with higher position resolution. <P>SOLUTION: The pattern drawing apparatus is designed to draw a pattern on a substrate by generating light spacially modulated with a diffraction grating type spatial light modulator having grating elements 5 arranged each of which is a combination of a set of fixed and movable ribbons and by transferring the substrate in an orientation vertical to the arrangement orientation of the grating elements 5. The grating element 5 can come into an OFF state that a light path-length difference between a light path going through a moving reflection surface and a light path going through a fixed reflection surface is equal to the integral multiple, inclusive of 0, of a wavelength of light plus a half wavelength of light; an ON-state that the light path-length difference is equal to the integral multiple of wavelength of light; an intermediate state between the ON-state and the OFF-state; and an incomplete ON-state between the intermediate state and the ON-state. When the pattern is drawn, the grating elements 5 in the OFF-state, in the intermediate state and in the incomplete ON-state are lined in this order. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
