发明名称 Liquid ejection apparatus, nanoimprint system, and liquid ejection method
摘要 According an aspect of the present invention, when causing the liquid ejection head to perform a feeding operation along a first direction, the substrate is retracted outside the projected feeding region of the liquid ejection head and the supporting member thereof prior to starting the feeding operation of the liquid ejection head, preventing dusts and other foreign matters, generated as a result of the feeding operation of the liquid ejection head and the supporting member, from being deposited on a surface of the substrate onto which the liquid is to be deposited.
申请公布号 US9028022(B2) 申请公布日期 2015.05.12
申请号 US201414471699 申请日期 2014.08.28
申请人 FUJIFILM Corporation 发明人 Kodama Kenichi;Wakamatsu Satoshi
分类号 B41J11/00;B41J2/045;B41J13/00 主分类号 B41J11/00
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A liquid ejection apparatus, comprising: a liquid ejection head which ejects functional liquid onto a substrate; a feeding device which has a supporting member to support the liquid ejection head and causes the liquid ejection head and the supporting member to perform a feeding operation in a first direction; a substrate moving device which moves the substrate along a second direction intersecting with the first direction; and a movement control device which controls the substrate moving device, wherein in a case where the functional liquid is ejected from the liquid ejection head, the movement control device controls the substrate moving device so as to move the substrate in the second direction immediately below the liquid ejection head, and in a case where the liquid ejection head and the supporting member are caused to perform the feeding operation in the first direction, the movement control device controls the substrate moving device so as to retract the substrate outside a projected feeding region where a feeding range of the liquid ejection head and the supporting member is projected downward in a perpendicular direction, prior to starting the feeding operation of the liquid ejection head and the supporting member.
地址 Tokyo JP