METHOD, APPARATUS AND SYSTEM FOR FORMING FILTER ELEMENTS ON DISPLAY SUBSTRATES

摘要

A method and system for forming filter elements on a plurality of display substrates using a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations is disclosed. The method involves receiving orientation information defining a disposition of a plurality of pixels associated with the at least one display substrate, identifying pixels in the plurality of pixels that are to receive filter material for forming a filter element on the pixel, selecting deposition locations within each of the identified pixels in accordance with the orientation information to meet an alignment criterion associated with placement of the filter element within the pixel, and controlling the digital imaging system to cause deposition of the filter material at the selected deposition locations. A method and system for forming filter elements on a substrate is also disclosed, which involves selecting locations to receive filter material for forming filter elements on the substrate, introducing a random variation in placement of the filter elements, and forming filter elements at the selected locations, the substrate being subsequently aligned to a display substrate for forming a display. A method and system for forming filter elements on a display substrate is also disclosed, which involves selectively depositing filter material to form the filter elements on a plurality of pixels associated with the display substrate, and selectively exposing the deposited filter material to thermal laser radiation to condition the deposited filter material.

主权项

1. A method for forming filter elements on at least one display substrate using a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations, the method comprising:
receiving orientation information defining a disposition of a plurality of pixels associated with the at least one display substrate; identifying pixels in said plurality of pixels that are to receive filter material for forming a filter element on the pixel, each identified pixel having associated extents within which the filter element is to be placed; selecting deposition locations within each of said identified pixels in accordance with said orientation information to meet an alignment criterion associated with placement of the filter element within said pixel, said alignment criterion comprising a threshold value representing a permitted deviation in placement of the filter element with respect to said extents, said selected deposition locations causing sequentially shifted placement of the filter element with respect to said extents in subsequent identified pixels while said sequentially shifted placement remains within said threshold value; and placement of the filter element to be shifted within said threshold value when said sequentially shifted placement exceeds said threshold value; andcontrolling the digital imaging system to cause deposition of the filter material at said selected deposition locations.