PLASMA CATHODE CHARGED PARTICLE LITHOGRAPHY SYSTEM

摘要

In one embodiment, a system for patterning a substrate includes a plasma chamber; a power source to generate a plasma within the plasma chamber; and an extraction plate system comprising a plurality of apertures and disposed along a side of the plasma chamber. The extraction plate system is configured to receive an extraction voltage that biases the extraction plate system with respect to the plasma chamber wherein the plurality of apertures are configured to extract a plurality of respective charged particle beamlets from the plasma. The system further includes a projection optics system to direct at least one of the plurality of charged particle beamlets to the substrate.

主权项

1. A system for patterning a substrate, comprising:
a plasma chamber; a power source to generate a plasma within the plasma chamber; an extraction plate system comprising a plurality of apertures and disposed along a side of the plasma chamber, the extraction plate system configured to receive an extraction voltage that biases the extraction plate system with respect to the plasma chamber, wherein the plurality of apertures are configured to extract a plurality of respective charged particle beamlets from the plasma; and a projection optics system configured to receive the plurality of charged particle beamlets and direct at least one of the plurality of charged particle beamlets to the substrate.